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Effects of laser irradiation on the structure and optical properties of ZnO thin films
E China Univ Sci & Technol, Dept Phys, Shanghai 200237, Peoples R China.
Örebro University, School of Science and Technology.
E China Univ Sci & Technol, Dept Phys, Shanghai 200237, Peoples R China.
E China Univ Sci & Technol, Inst Nucl Phys, Shanghai 200237, Peoples R China.
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2010 (English)In: Materials letters (General ed.), ISSN 0167-577X, E-ISSN 1873-4979, Vol. 64, no 19, p. 2072-2075Article in journal (Refereed) Published
Abstract [en]

The effects of laser irradiation on the surface microstructure and optical properties of ZnO films deposited on glass substrates were investigated experimentally and compared with those of thermal annealing. X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements showed that the irradiation treatment with an Ar+ laser of 514 nm for 5 min improves the crystalline quality of ZnO thin films through increasing the grain size and enhancing the c-axis orientation, with the effects similar to those of the thermal annealing at 500 °C for 1 h. Laser irradiation was found to be more effective both for the relaxation of the residual compressive stress in the as-grown films and for the modification of the surface morphology. A significant increase in the UV absorption and a widening in the optical band-gap of the films were also observed after laser irradiation.

Place, publisher, year, edition, pages
Amsterdam, Netherlands: Elsevier, 2010. Vol. 64, no 19, p. 2072-2075
Keyword [en]
Thin films, Semiconductors, Laser treatment, Annealing, Microstructure, Optical properties
National Category
Chemical Sciences
Research subject
Chemistry
Identifiers
URN: urn:nbn:se:oru:diva-12633DOI: 10.1016/j.matlet.2010.06.022ISI: 000281595100012OAI: oai:DiVA.org:oru-12633DiVA: diva2:373763
Available from: 2010-12-01 Created: 2010-12-01 Last updated: 2017-12-12Bibliographically approved

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Tu, Yaoquan

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